Remote Plasma PVD Chamber (IPMS-CNT04.2) - PR917294-2480-P

1 piece Remote Plasma PVD Chamber A process chamber as equipment upgrade to deposit metallic and non-metallic thin films via PVD (sputtering) process on wafers with a diameter of 300 mm. The sputter chamber as an upgrade of the existing Polyteknik Flextura 300 deposition cluster must be compatible to the existing mainframe "Flextura 300" and the already existing chambers "Confocal Sputter Module", "Degas Module", "Cooling Module", and "MBE Module". Optional service items: 3.1.11 Remote Plasma chamber - general plasma emission monitoring (PEM) with feedback control please specify type and accuracy 3.1.12 Remote Plasma chamber - general Residual gas analyzer (RGA) mass spectrometer delivery option 3.1.18 Remote Plasma chamber - general Quartz Crystal Microbalance for deposition rate determination, removable/coverable without chamber opening (e.g. shutter or retractable) delivery option; please specify number of QCMs, type of removal/cover mechanism 3.2.3 Remote Plasma chamber - gas lines additional gas inlet for pre-mixed bottles with standard flange delivery option 3.4.6 Remote Plasma chamber - targets preinstalled target materials and purity: Zr (4N), Nb (4N) please quote as delivery option 3.4.7 Remote Plasma chamber - targets additional preinstalled target materials and purity: Cu (5N), SiN (3N) please quote as delivery option 5.7 Extended Warranty Extension of the basic warranty period for one further year Please quote as an option