Plasma-Atomic-Layer-Deposition Anlage für hochreine Metall Schichten insbesondere Titannitrid-Schichten (

Deadline:N/A

We were not able to find a link to the source, please find contact details in the documents.

Tender information

Wien

Type

Voluntary ex ante transparency

Procedure

Negotiated without a call for competition

Ref. number

26300.02-076-2026

Duration

6 months

Plasma-Atomic-Layer-Deposition Anlage für hochreine Metall Schichten insbesondere Titannitrid-Schichten

Metall-Atomlagenabscheidungsanlage

Buyer

Technische Universität Wien

Document name	Upload date	File size
First document.pdf	1 Jan 1970, 00:00	1 Bytes
Second document.pdf	1 Jan 1970, 00:00	1 Bytes

Information on this page originates from the following sources: TED

Buyer

Technische Universität Wien

Contract awarded

Important dates

9 Sept - Publication date

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We were not able to find a link to the source, please find contact details in the documents.