University College Cork request the supply of a Total Reflection X-ray Fluorescence (TXRF) Analysis Spectrometer for non-destructive, trace-level wafer surface contamination analysis, with automated handling and rapid full-wafer mapping. The system must support routine monitoring on 100 mm and up to 200 mm wafers and be compatible with bare and processed wafers including thin films, epitaxial layers, and compound semiconductor substrates. The Spectrometer must be suitable for in a research cleanroom environment, with robust software control, recipe management, and data export.