FIB & SEM system (HHI-01) - PR1216644-3220-P

1 FIB-SEM dual-beam system As part of the procurement process, a field-free (without immersion optics) focused ion beam system (FIB-SEM) combined with a high-resolution scanning electron microscope (SEM) is to be selected. The system will be used for patterning, nanostructuring, and cross-sectional and surface analysis of primarily III/V semiconductors, LNOI, polymers and resists, as well as process products typical of semiconductor technology. Programmable and automated routines should be configurable where possible. Options - Advanced training course for 15 days (2 people); availability to be confirmed as required - 1 gas injection system with additional components; to be specified in the tender - Software module for importing KLAF files