Facet passivation and coating system (HHI-08) - PR1216551-3220-P

The tendered system is intended for the deposition of optical functional coatings on opto‑electronic semiconductor devices, in particular for anti‑reflection coatings and facet passivation of high‑power laser devices. In high‑power lasers, defects at the facet surface can lead to localized hot spots and thermal damage. Conventional sputtering processes involve comparatively high ion energies, which may adversely affect sensitive facet surfaces. Electron Cyclotron Resonance (ECR) plasma‑assisted deposition enables a significant reduction of ion impact energy by decoupling plasma generation from ion acceleration, allowing gentle and reliable coating. For this reason, an ECR‑based coating system is mandatory for the present application. Optionen Extended Warranty Spectral System Measurement range Accuracy - thin films 5-20 nm Accuracy - medium thickness 20-200 nm Optical constants Flip mechanism Cooling water